Plasma Immersion
Two vacuum chambers are available for PIII&D. One of those chambers offers the possibility to combine magnetron sputtering with the plasma process.
The samples are fixed on a plate (usually with screws) that is supported by an insulator in the inside of the chamber. The voltage is applied via a high voltage feedthrough. Two high voltage pulsers and one DC power supply can be connected.
For characterization purposes a quadrupole mass spectrometer and an optical spectrometer are available.
Device Specifications
|
Chamber 1 for implantation and preparation of DLC films |
|
| Volume | 0.075 m3 |
| Base pressure | 10-7 hPa |
| Diameter sample holder | 10 cm |
| Number of MFCs | 4 |
| High voltage pulser | |
| Max. voltage | 25 kV |
| Pulse length | 1 – 100 µs |
| Pulse rise time | 300 ns |
| DC power supply | |
| Max. voltage | 3.5 kV |
| Max. current | 1.5 A |
|
Chamber 2 for the preparation of DLC and metal films |
|
| Volume | 0.065 m3 |
| Base pressure | 2 x 10-7 hPa |
| Diameter sample holder | 10 – 20 cm |
| Number of MFCs | 4 |
| Sputter source | |
| Target diameter | 2 in. (5,1 cm) |
| Power supply | 300 W RF |
| Flexible head and positioning | |
| Integrated shutter |
