Spin Coating

Automated coating of many substrates with viscous polymeric precursors.

Spin Coater

Equipment:SPIN150-v3, SPS Semiconductor Production Systems

Characteristics:

Substrate size: up to 150 mm or 6 inch in diameter, 101,6 x 101,6 mm (4“ x 4”) in square

max. Speed: 10000 rpm, for 1000 sec. up to 99 Steps