DAISY-FUN
DArmstadt's Integrated SYstem for FUNdamental research

The DAISY-FUN laboratory is equipped to selectively investigate the surfaces and interfaces of metals and oxides used in electrocatalysis and beyond. Well-defined single crystals, thin films, and industrially relevant catalysts are addressed here. To this end, chemical, electronic, structure, and vibrational properties are assessed by surface sensitive techniques in contamination-free conditions. This is achieved by coupling sample preparation and analytical techniques in one vacuum system. Samples can be introduced from atmospheric conditions via a load-lock or via a direct vacuum or glovebox transfer.

Detailed Experimental Setup

DAISY-FUN Setup
DAISY-FUN Setup

Thin film growth:

  • Thin film growth by physical vapor deposition (PVD) techniques like magnetron sputtering and evaporation. Metals, alloys and oxidic compounds can be cleanly prepared and tuned regarding their crystalline qualities and defectiveness.

Surface treatments:

  • Surface cleaning and recrystallisation by sputter-milling and annealing
  • Surface cleaning and oxidation by oxygen plasma source
  • Gas adsorption (liquid nitrogen cooling possible)
  • Electrochemical treatments under inert gas atmosphere with a direct sample transfer to the vacuum.

Surface analysis techniques:

  • X-Ray and Ultraviolet Photoelectron Spectroscopy (XPS, UPS)
  • Inverse Photoemission Spectroscopy (IPES)
  • Low Energy Electron diffraction (LEED)
  • High Resolution Electron Energy Loss Spectroscopy (HREELS)
  • Kelvin Probe
  • Thermal Desorption Spectroscopy (TPD)