Publikationen 2025

E. Miranda, E. Piros, F. L. Aguirre, T. Kim, P. Schreyer, J. Gehrunger, T. Schwarz, T. Oster, K. Hofmann, J. Suñé, C. Hochberger, and L. Alff
Analysis of the Voltage Ramp Rate Effects on the Programming Characteristics of Bipolar-Type Memristive Devices
IEEE Trans. Nanotechnol., 24, 205-208 (2025)
doi: 10.1109/TNANO.2025.3556856

J. Palakkal, A. Arzumanov, R. Xie, z. Li, N. Hadaeghi, T. Wagner, T. Jiang, Y. Ruan, G. Cherkashinin, L. Molina-Luna, H. Zhang, L. Alff
Off-Stoichiometry Engineering of the Electrical and Optical Properties of SrNbO3 Using oxide molecular beam epitaxy
Adv. Funct. Mater., 2419990 (2025)
doi: 10.1002/adfm.202419990

G. d’Andrea, S. Zhou, U. Kentsch, M. Major, P. Rani, G. Gkouzia, B. Zhao, Y. Ablets, I. Dirba, H. Zhang, L. Alff
Improved lattice elongation for Fe8Nx (x > 1) thin films prepared via nitrogen ion implantation
AIP Advances 15, 035244 (2025)
doi: 10.1063/9.0000902

C.-C. Meyer, E. Artes, M. Bender, J. Brötz, Ch. E. Düllmann, T. Gouder, E. Jäger, B. Kindler, S. Herz, B. Lommel, M. Major, C. Mokry, F. Munnik, M. Rapps, D. Renisch, J. Runke, A. Seibert, C. Trautmann, N. Trautmann, O. Walter, A. Yakushev
Microscopic and spectroscopic analysis of ion-irradiated molecular-plated thin films for superheavy element production
Nucl. Instrum. Methods Phys. Res. A, 1075, 170361 (2025)
doi: 10.1016/j.nima.2025.170361

C. Tian, C. Maheu, X. Huang, F. E. Oropeza, M. Major, J. Brötz, M. Einert, W. Donner, K. H. Zhang and J. P. Hofmann
Evaluating the electronic structure and stability of epitaxially grown Sr-doped LaFeO3 perovskite alkaline O2 evolution model electrocatalysts
RSC Appl. Interfaces, 2, 122 (2025)
doi: 10.1039/D4LF00260A

Z. Liang, A. Baubaid, M. Radtke, M. Mellin, C. Maheu, S. Maiti, H. Sclar, I. Píš, S. Nappini, E. Magnano, F. Bondino, R. Winkler, R. Hausbrand, C. Hess, L. Alff, B. Markovsky, D. Aurbach, W. Jaegermann, G. Cherkashinin
Novel Insights into Enhanced Stability of Li-Rich Layered and High-Voltage Olivine Phosphate Cathodes for Advanced Batteries through Surface Modification and Electron Structure Design
Adv. Sci., 12, 2413054 (2025)
doi: 10.1002/advs.202413054